SÜSS MicroTec, MA6 Modus Operandi:Service-ModeContamination category:CSample-size:100 mm, 150 mm Wafer FOM-Name:- Mask Aligner MA 6 Location:ZMNT, Room 009 Tool manager: Jochen Heiss Instruction video: Not available Tool description: Mask Aligner and Bond Aligner, UV NIL Tooling
Category: Photolithography
Wet Bench for Resist Coating and Development
Arias Modus Operandi:User-ModeContamination category:CSample-size:100 mm, 150 mm Wafer FOM-Name:- Litho-Bench 2Location:ZMNT, Room 009 Tool manager: Jochen Heiss Instruction video: Not available Tool description: Hotplate small, medium, big (Gestigkeit), Spin Coater (Sawatec, SM 180)
Wet Bench for Resist Coating
Arias Modus Operandi:User-ModeContamination category:CSample-size:100 mm, 150 mm Wafer FOM-Name:- Litho-Bench 1Location:ZMNT, Room 009 Tool manager: Jochen Heiss Instruction video: Not available Tool description: Hotplate small, medium, big (Gestigkeit), Spin Coater RC8 (SÜSS MicroTec, RC8 )
Wet Bench for Lithography Processes
Arias Modus Operandi:Service-ModeContamination category:B Sample-size:wide range of sample and wafer sizes up to 8″ FOM-Name:- AMO – Wet Bench LithographyLocation:AMO Tool manager: AMO Instruction video: Not available Tool description: Single wafer, batch and samples; cleaning and resist processes
Interference Lithography System
Self-made Modus Operandi:Service-ModeContamination category:BSample-size:4″, 6″, 8″ and every rectangular shape within FOM-Name:- AMO – Interference Lithography SystemLocation:AMO Tool manager: AMO Instruction video: Not available Tool description: 180 nm – 2.5 μm pitch; stitching free gratings
Automatic Resist Coater and Developer
EVG, 150 Modus Operandi:Service-ModeContamination category:BSample-size:4″ – 8″ wafers FOM-Name:- AMO – Automatic Resist Coater and DeveloperLocation:AMO Tool manager: AMO Instruction video: Not available Tool description: 4″- 8″ automatic resist coater and developer; AZ MiR701, Primer, AZ5214E
Photolithography System (Stepper)
Canon, FPA 3000 i5+ Modus Operandi:Service-ModeContamination category:BSample-size:only 6″ wafers; no samples FOM-Name:- AMO – StepperLocation:AMO Tool manager: AMO Instruction video: Not available Tool description: 6″ i-line Stepper with 0.5 μm resolution
Photolithography System (Mask Aligner)
EVG, 420 Modus Operandi:Service-ModeContamination category:CSample-size:from samples of 10×10 mm² up to 6″ wafers FOM-Name:- AMO – Mask Aligner (EVG 420)Location:AMO Tool manager: AMO Instruction video: Not available Tool description: 6″ semi-automatic mask aligner; 2 µm resolution
Mask Aligner (MJB3)
SÜSS MicroTec, MJB3 Modus Operandi:User-modeContamination category: B, CSample-size:Pieces … 3″ FOM-Name:- Physik – Photolithography System (MJB3)Location:Physikzentrum, Room 28A313 Tool manager: Arne Hollmann Instruction video: Open video Tool description: SÜSS MicroTec, MJB3
Wet Benches Solvents, Resists, Developers
Modus Operandi:User-modeContamination category: CSample-size:Pieces … 4″ FOM-Name: – Physik – Wet Benches Location: Physikzentrum, Room 28A313 Tool manager:Natalie BrugerInstruction video:Open videoTool description:Three wet benches for solvents (isopropanol, acetone), resists (incl. spinner and hotplates) and developers.