Vistec, EBPG 5200 Modus Operandi:Service-ModeContamination category:B and C (dedicated holder)Sample-size:from samples of 10×10 mm² up to 8″ wafers FOM-Name:- AMO – E-Beam Litho (Vistec EBPG 5200)Location:AMO Tool manager: AMO Instruction video: Not available Tool description: E-Beam lithography tool; 50/100 kV; sub 10 nm resolution
Category: Electron-Beam Lithography
E-Beam Lithography (eLINE)
RAITH, eLINE Modus Operandi:User-modeContamination category: B, CSample-size:Pieces … 4″ FOM-Name:- Physik – E-Beam Litho (Raith eLINE)Location:Physikzentrum, Room 28A315 Tool manager: Lars Schreiber Instruction video: Open video Tool description: Raith, eLINE
Wet Benches Solvents, Resists, Developers
Modus Operandi:User-modeContamination category: CSample-size:Pieces … 4″ FOM-Name: – Physik – Wet Benches Location: Physikzentrum, Room 28A313 Tool manager:Natalie BrugerInstruction video:Open videoTool description:Three wet benches for solvents (isopropanol, acetone), resists (incl. spinner and hotplates) and developers.
Electron-Beam Lithography (RAITH150 Two)
Raith, RAITH150 Two Modus Operandi:User-modeContamination category: A,B,C if appropriate chucks are usedSample-size:Pieces … 6″ wafers FOM-Name:– IHT – E-Beam Litho (RAITH150 Two)Location:WSH, Room 24B102 Tool manager: Birger Berghoff Instruction video: Tool description: