All Processing Tools

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  • Wet Bench for Resist and HMDS Coating

    Arias

    Usage

    • Modus Operandi:
      User-mode
    • Contamination category: A, B, C if appropriate handle wafer and chucks are used
    • Sample-size:
      Pieces ... 6″ wafer
    Resist Coating including HMDS

    FOM-Name and Location

    Resources

    • Tool manager:
      Birger Berghoff
    • Instruction video:
      Open video
    • Tool description:
    Continue reading →

  • Wet Bench for Solvents and Resist Development

    Arias

    Usage

    • Modus Operandi:
      User-mode
    • Contamination category: A, B
    • Sample-size:
      Pieces ... 6″ wafers
    Wet Bench for Solvents and Resist Development

    FOM-Name and Location

    • FOM-Name:
      Wet Bench Solvents and Resist Development
    • Location:
      CMNT, Room 001

    Resources

    • Tool manager:
      Birger Berghoff
    • Instruction video:
      Open video
    • Tool description: 
    Continue reading →

  • Wet Bench for Standard Cleaning (RCA)

    Arias

    Usage

    • Modus Operandi:
      User-mode
    • Contamination category: A, B
    • Sample-size:
      Pieces ... 8″ wafers
    Wet Bench Standard Clean (RCA)

    FOM-Name and Location

    Resources

    • Tool manager:
      Birger Berghoff
    • Instruction video:
      Open video
    • Tool description:
    Continue reading →

  • Wet Benches for Solvents, Resists and Developers

    Usage

    • Modus Operandi:
      User-mode
    • Contamination category: C
    • Sample-size:
      Pieces ... 4″
    Physik Wetbenches

    FOM-Name and Location

    • FOM-Name:
      - Physik - Wet Benches
    • Location:
      Physikzentrum, Room 28A313

    Resources

    • Tool manager:
      Natalie Bruger
    • Instruction video:
      Open video
    • Tool description:
      Three wet benches for solvents (isopropanol, acetone), resists (incl. spinner and hotplates) and developers.
    Continue reading →

  • Dry Oxidation Furnace

    Centrotherm

    Usage

    • Modus Operandi:
      Service-Mode
    • Contamination category:
      A
    • Sample-size:
      up to 200x6" or up to 50x8" wafers per run; 15x15 cm tray for samples

    FOM-Name and Location

    • FOM-Name:
      - AMO - Dry Oxidation Furnace
    • Location:
      AMO

    Resources

    • Tool manager:
      AMO
    • Instruction video:
      Not available
    • Tool description:
      3″ – 8″ Centrotherm furnace; dry oxidation up to 300 nm
    Continue reading →


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