Photolithography System (Mask Aligner / Bond Aligner)
SÜSS MicroTec, MA/BA6
Usage
- Modus Operandi:
User-mode - Contamination category: A,B,C if appropriate chuck and masks are used
- Sample-size:
Pieces ... 6″ wafer
FOM-Name and Location
- FOM-Name:
Optical Lithography (MABA6) - Location:
CMNT, Room 009
Resources
- Tool manager:
Birger Berghoff - Instruction video:
Open video - Tool description:
Top- and back-side alignment