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Wet Bench Solvents and Resist Development

April 25, 2016July 17, 2017 Joachim Knoch Available Processing Tools, Photolithography, Wet Chemical Processing

Wet Bench for Solvents and Resist Development

Arias

Usage

  • Modus Operandi:
    User-mode
  • Contamination category: A, B
  • Sample-size:
    Pieces ... 6″ wafers
Wet Bench for Solvents and Resist Development

FOM-Name and Location

  • FOM-Name:
    Wet Bench Solvents and Resist Development
  • Location:
    CMNT, Room 001

Resources

  • Tool manager:
    Birger Berghoff
  • Instruction video:
    Open video
  • Tool description: 

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Wet Bench Fume Hood
Electron-Beam Lithography (RAITH150 Two)

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