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RIE (RIE-51)

June 2, 2016July 17, 2017 Joachim Knoch Available Processing Tools, Dry Etching

Parallel-Plate Reactive Ion Etching Tool

MRC, RIE-51

Usage

  • Modus Operandi:
    User-mode
  • Contamination category: A, B, C
  • Sample-size:
    Pieces ... 4″
Parallel-Plate Reactive Ion Etching

FOM-Name and Location

  • FOM-Name:
    RIE 51
  • Location:
    WSH, Room 24B131

Resources

  • Tool manager:
    Birger Berghoff
  • Instruction video:
    Open video
  • Tool description:
    SF6, CHF3, O2 and BCl3 based etching

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ICP-RIE (Fluorian)
SEM 1 (Zeiss Sigma)

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