Photolithography

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• Photolithography System (Mask Aligner)

  SÜSS MicroTec, MA6

  Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    C
  • Sample-size:
    100 mm, 150 mm Wafer

  

  FOM-Name and Location

  • FOM-Name:
    - Mask Aligner MA 6
  • Location:
    ZMNT, Room 009

  Resources

  • Tool manager:
    Jochen Heiss
  • Instruction video:
    Not available
  • Tool description:
    Mask Aligner and Bond Aligner, UV NIL Tooling
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• Wet Bench for Resist Coating and Development

  Arias

  Usage

  • Modus Operandi:
    User-Mode
  • Contamination category:
    C
  • Sample-size:
    100 mm, 150 mm Wafer

  

  FOM-Name and Location

  • FOM-Name:
    - Litho-Bench 2
  • Location:
    ZMNT, Room 009

  Resources

  • Tool manager:
    Jochen Heiss
  • Instruction video:
    Not available
  • Tool description:
    Hotplate small, medium, big (Gestigkeit), Spin Coater (Sawatec, SM 180)
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• Wet Bench for Resist Coating

  Arias

  Usage

  • Modus Operandi:
    User-Mode
  • Contamination category:
    C
  • Sample-size:
    100 mm, 150 mm Wafer

  

  FOM-Name and Location

  • FOM-Name:
    - Litho-Bench 1
  • Location:
    ZMNT, Room 009

  Resources

  • Tool manager:
    Jochen Heiss
  • Instruction video:
    Not available
  • Tool description:
    Hotplate small, medium, big (Gestigkeit), Spin Coater RC8 (SÜSS MicroTec, RC8 )
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• Wet Bench for Lithography Processes

  Arias

  Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    B
  • Sample-size:
    wide range of sample and wafer sizes up to 8"

  

  FOM-Name and Location

  • FOM-Name:
    - AMO - Wet Bench Lithography
  • Location:
    AMO

  Resources

  • Tool manager:
    AMO
  • Instruction video:
    Not available
  • Tool description:
    Single wafer, batch and samples; cleaning and resist processes
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• Interference Lithography System

  Self-made

  Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    B
  • Sample-size:
    4", 6", 8" and every rectangular shape within

  

  FOM-Name and Location

  • FOM-Name:
    - AMO - Interference Lithography System
  • Location:
    AMO

  Resources

  • Tool manager:
    AMO
  • Instruction video:
    Not available
  • Tool description:
    180 nm – 2.5 μm pitch; stitching free gratings
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• Automatic Resist Coater and Developer

  EVG, 150

  Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    B
  • Sample-size:
    4" - 8" wafers

  

  FOM-Name and Location

  • FOM-Name:
    - AMO - Automatic Resist Coater and Developer
  • Location:
    AMO

  Resources

  • Tool manager:
    AMO
  • Instruction video:
    Not available
  • Tool description:
    4″- 8″ automatic resist coater and developer; AZ MiR701, Primer, AZ5214E
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• Photolithography System (Stepper)

  Canon, FPA 3000 i5+

  Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    B
  • Sample-size:
    only 6" wafers; no samples

  

  FOM-Name and Location

  • FOM-Name:
    - AMO - Stepper
  • Location:
    AMO

  Resources

  • Tool manager:
    AMO
  • Instruction video:
    Not available
  • Tool description:
    6" i-line Stepper with 0.5 μm resolution
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• Photolithography System (Mask Aligner)

  EVG, 420

  Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    C
  • Sample-size:
    from samples of 10×10 mm² up to 6" wafers

  

  FOM-Name and Location

  • FOM-Name:
    - AMO - Mask Aligner (EVG 420)
  • Location:
    AMO

  Resources

  • Tool manager:
    AMO
  • Instruction video:
    Not available
  • Tool description:
    6" semi-automatic mask aligner; 2 µm resolution
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• Photolithography System

  SÜSS MicroTec, MJB3

  Usage

  • Modus Operandi:
    User-mode
  • Contamination category: B, C
  • Sample-size:
    Pieces ... 3″

  

  FOM-Name and Location

  • FOM-Name:
    - Physik - Photolithography System (MJB3)
  • Location:
    Physikzentrum, Room 28A313

  Resources

  • Tool manager:
    Arne Hollmann
  • Instruction video:
    Open video
  • Tool description:
    SÜSS MicroTec, MJB3
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• Wet Benches for Solvents, Resists and Developers

  Usage

  • Modus Operandi:
    User-mode
  • Contamination category: C
  • Sample-size:
    Pieces ... 4″

  

  FOM-Name and Location

  • FOM-Name:
    - Physik - Wet Benches
  • Location:
    Physikzentrum, Room 28A313

  Resources

  • Tool manager:
    Natalie Bruger
  • Instruction video:
    Open video
  • Tool description:
    Three wet benches for solvents (isopropanol, acetone), resists (incl. spinner and hotplates) and developers.
    
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