Wet Chemical Processing

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• Wet Bench for Resist Coating and Development

  Arias

  Usage

  • Modus Operandi:
    User-Mode
  • Contamination category:
    C
  • Sample-size:
    100 mm, 150 mm Wafer

  

  FOM-Name and Location

  • FOM-Name:
    - Litho-Bench 2
  • Location:
    ZMNT, Room 009

  Resources

  • Tool manager:
    Jochen Heiss
  • Instruction video:
    Not available
  • Tool description:
    Hotplate small, medium, big (Gestigkeit), Spin Coater (Sawatec, SM 180)
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• Wet Bench for Resist Coating

  Arias

  Usage

  • Modus Operandi:
    User-Mode
  • Contamination category:
    C
  • Sample-size:
    100 mm, 150 mm Wafer

  

  FOM-Name and Location

  • FOM-Name:
    - Litho-Bench 1
  • Location:
    ZMNT, Room 009

  Resources

  • Tool manager:
    Jochen Heiss
  • Instruction video:
    Not available
  • Tool description:
    Hotplate small, medium, big (Gestigkeit), Spin Coater RC8 (SÜSS MicroTec, RC8 )
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• Wet Bench for Standard Cleaning (RCA)

  Arias

  Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    A
  • Sample-size:
    dedicated holder for 2x2 cm2 and 3x3 cm2; 4", 5", 6", 8" wafers

  

  FOM-Name and Location

  • FOM-Name:
    - AMO - Wet Bench RCA
  • Location:
    AMO

  Resources

  • Tool manager:
    AMO
  • Instruction video:
    Not available
  • Tool description:
    Single wafer and batch; cleaning processes
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• Wet Bench for Lithography Processes

  Arias

  Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    B
  • Sample-size:
    wide range of sample and wafer sizes up to 8"

  

  FOM-Name and Location

  • FOM-Name:
    - AMO - Wet Bench Lithography
  • Location:
    AMO

  Resources

  • Tool manager:
    AMO
  • Instruction video:
    Not available
  • Tool description:
    Single wafer, batch and samples; cleaning and resist processes
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• Wet Bench for Imprint Processes

  Arias

  Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    B and C (dedicated halves)
  • Sample-size:
    pieces - 8" wafers

  

  FOM-Name and Location

  • FOM-Name:
    - AMO - Went Bench Imprint
  • Location:
    AMO

  Resources

  • Tool manager:
    AMO
  • Instruction video:
    Not available
  • Tool description:
    wet bench right (class C), carrier left (class B)
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• Wet Benches for Solvents, Resists and Developers

  Usage

  • Modus Operandi:
    User-mode
  • Contamination category: C
  • Sample-size:
    Pieces ... 4″

  

  FOM-Name and Location

  • FOM-Name:
    - Physik - Wet Benches
  • Location:
    Physikzentrum, Room 28A313

  Resources

  • Tool manager:
    Natalie Bruger
  • Instruction video:
    Open video
  • Tool description:
    Three wet benches for solvents (isopropanol, acetone), resists (incl. spinner and hotplates) and developers.
    
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• Wet Bench for Solvents and Resist Development

  Arias

  Usage

  • Modus Operandi:
    User-mode
  • Contamination category: A, B
  • Sample-size:
    Pieces ... 6″ wafers

  

  FOM-Name and Location

  • FOM-Name:
    Wet Bench Solvents and Resist Development
  • Location:
    CMNT, Room 001

  Resources

  • Tool manager:
    Birger Berghoff
  • Instruction video:
    Open video
  • Tool description: 
  Continue reading →

• Wet Bench Fume Hood

  Arias

  Usage

  • Modus Operandi:
    User-mode
  • Contamination category: A,B (right side),C (left side) if appropriate labware and beakers are used
  • Sample-size:
    Pieces ... 6″ wafers

  

  FOM-Name and Location

  • FOM-Name:
    Wet Bench Fume Hood
  • Location:
    CMNT, Room 001

  Resources

  • Tool manager:
    Birger Berghoff
  • Instruction video:
    Open video
  • Tool description: 
  Continue reading →

• Single-Wafer Cleaning System

  acp, Corwet 200M

  Usage

  • Modus Operandi:
    User-mode
  • Contamination category: A, B
  • Sample-size:
    4″ wafers only

  

  FOM-Name and Location

  • FOM-Name:
    Single-Wafer Cleaner
  • Location:
    CMNT, Room 001

  Resources

  • Tool manager:
    Birger Berghoff
  • Instruction video:
  • Tool description: 
  Continue reading →

• Wet Bench for Standard Cleaning (RCA)

  Arias

  Usage

  • Modus Operandi:
    User-mode
  • Contamination category: A, B
  • Sample-size:
    Pieces ... 8″ wafers

  

  FOM-Name and Location

  • FOM-Name:
    Wet Bench RCA
  • Location:
    CMNT, Room 001

  Resources

  • Tool manager:
    Birger Berghoff
  • Instruction video:
    Open video
  • Tool description:
  Continue reading →

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