Photolithography System (Mask Aligner)
EVG, 420
Usage
- Modus Operandi:
Service-Mode - Contamination category:
C - Sample-size:
from samples of 10×10 mm² up to 6" wafers
FOM-Name and Location
- FOM-Name:
- AMO - Mask Aligner (EVG 420) - Location:
AMO
Resources
- Tool manager:
AMO - Instruction video:
Not available - Tool description:
6" semi-automatic mask aligner; 2 µm resolution