Nanoimprint Lithography

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• Photolithography System (Mask Aligner)

  SÜSS MicroTec, MA6

  Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    C
  • Sample-size:
    100 mm, 150 mm Wafer

  

  FOM-Name and Location

  • FOM-Name:
    - Mask Aligner MA 6
  • Location:
    ZMNT, Room 009

  Resources

  • Tool manager:
    Jochen Heiss
  • Instruction video:
    Not available
  • Tool description:
    Mask Aligner and Bond Aligner, UV NIL Tooling
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• Wet Bench for Imprint Processes

  Arias

  Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    B and C (dedicated halves)
  • Sample-size:
    pieces - 8" wafers

  

  FOM-Name and Location

  • FOM-Name:
    - AMO - Went Bench Imprint
  • Location:
    AMO

  Resources

  • Tool manager:
    AMO
  • Instruction video:
    Not available
  • Tool description:
    wet bench right (class C), carrier left (class B)
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• SCIL UV Nanoimprint Lithography System

  SÜSS MicroTec, MA8 Gen3

  Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    B
  • Sample-size:
    2" - 8" wafers

  

  FOM-Name and Location

  • FOM-Name:
    - AMO - SCIL UV Nanoimprint
  • Location:
    AMO

  Resources

  • Tool manager:
    AMO
  • Instruction video:
    Not available
  • Tool description:
    SCIL 2″-8″ UV-Nanoimprint Lithography
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• Soft UV Nanoimprint Lithography Prototype System

  EVG, 620

  Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    B
  • Sample-size:
    4"- 6" flexible template size

  

  FOM-Name and Location

  • FOM-Name:
    - AMO - Soft UV Nanoimprint
  • Location:
    AMO

  Resources

  • Tool manager:
    AMO
  • Instruction video:
    Not available
  • Tool description:
    Soft UV Nanoimprint prototype
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