Wet Bench for Imprint Processes

Joachim Knoch Available Processing Tools, Nanoimprint Lithography, Wet Chemical Processing

Wet Bench for Imprint Processes

Arias

Usage

  • Modus Operandi:
    Service-Mode
  • Contamination category:
    B and C (dedicated halves)
  • Sample-size:
    pieces - 8" wafers

FOM-Name and Location

  • FOM-Name:
    - AMO - Went Bench Imprint
  • Location:
    AMO

Resources

  • Tool manager:
    AMO
  • Instruction video:
    Not available
  • Tool description:
    wet bench right (class C), carrier left (class B)