Low Pressure Chemical Vapour Deposition Furnace for Polycrystalline Silicon
Centrotherm
Usage
- Modus Operandi:
Service-Mode - Contamination category:
A - Sample-size:
up to 25 wafers per run; 15x15 cm tray for samples
FOM-Name and Location
- FOM-Name:
- AMO - LPCVD-Poly - Location:
AMO
Resources
- Tool manager:
AMO - Instruction video:
Not available - Tool description:
Polysilicon; 620°C; SiH4 process; up to 500 nm