Reactive-Ion Etching System
Tegal, 901
Usage
- Modus Operandi:
User-Mode - Contamination category:
C - Sample-size:
100 mm Wafer
FOM-Name and Location
- FOM-Name:
- RIE (Tegal 901) - Location:
ZMNT, Room 006
Resources
- Tool manager:
Jochen Heiss - Instruction video:
Not available - Tool description:
Etching gases: N2, O2, CHF3, CF4, SF6, Ar