Wet Bench for Resist Coating and Development

Joachim Knoch Available Processing Tools, Photolithography, Wet Chemical Processing

Wet Bench for Resist Coating and Development

Arias

Usage

  • Modus Operandi:
    User-Mode
  • Contamination category:
    C
  • Sample-size:
    100 mm, 150 mm Wafer

FOM-Name and Location

  • FOM-Name:
    - Litho-Bench 2
  • Location:
    ZMNT, Room 009

Resources

  • Tool manager:
    Jochen Heiss
  • Instruction video:
    Not available
  • Tool description:
    Hotplate small, medium, big (Gestigkeit), Spin Coater (Sawatec, SM 180)