Atomic-Layer Etching System for Si-based Materials

Joachim Knoch Available Processing Tools, Dry Etching

Atomic-Layer Etching System

Oxford Instruments, PlasmaPro 100 Cobra

Usage

  • Modus Operandi:
    User-mode
  • Contamination category: A, B
  • Sample-size:
    Pieces ... 6″ wafers
Atomic-Layer Etching System

FOM-Name and Location

  • FOM-Name: ALE for Si-based Materials (Oxford Instruments, PlasmaPro100)
  • Location: CMNT, Room 007

Resources

  • Tool manager: Birger Berghoff
  • Instruction video: Open video
  • Tool description: Atomic-layer etching system for Si-based Materials. Available etching processes: Si, SiO2. Available gases: SF6, CH4, CHF3, O2, H2, Cl2,