Pages
Posts
- Teaching at ZMNT
- Working in the Cleanroom
- ZMNT
- Microsystems
- Plasma Processes
- Profilometer (DektakXT)
- MA_BA6
- MA4
- Spectroscopic Ellipsometer
- DRIE (Cobra)
- HF Vapor Phase Etcher
- Wet Bench Resist and HMDS Coating
- Wet Bench Standard Clean (RCA)
- Single Wafer Cleaning
- Wet Bench Fume Hood
- Wet Bench Solvents and Resist Development
- Electron-Beam Lithography (RAITH150 Two)
- Plasma Asher/SF6 Plasma Etcher
- Laser Scanning Microscope
- RTP (AS-One 150)
- RTP (RTP 150)
- Clustertool (ALD+ICP-CVD)
- Wafer Bonder (SB6e)
- Plasma Asher (Tegal, 915)
- E-Beam and Thermal Evaporator with Sputter Target
- Wet Benches Solvents, Resists, Developers
- Annealer (Self-built)
- IQE Measurements (PV Tools)
- ECV
- PECVD (Petzi)
- E-Beam Lithography (eLINE)
- Plasma Asher (PP35)
- Mask Aligner (MJB3)
- SEM 2 (Zeiss Sigma)
- CMP
- Low- and High-Temp Vac Probe Station
- Hall Measurements
- Sheet Resistance Measurements (Sherescan)
- micro-Raman Spectrometer
- Dicing Saw (DISCO DAD321)
- ICP-RIE (Fluorian)
- RIE (RIE-51)
- SEM 1 (Zeiss Sigma)
- SEM 3 (JEOL)
- Electron-Beam Lithography System
- Photolithography System (Mask Aligner)
- Photolithography System (Stepper)
- Automatic Resist Coater and Developer
- Interference Lithography System
- Soft UV Nanoimprint Lithography Prototype System
- SCIL UV Nanoimprint Lithography System
- Wet Bench for Imprint Processes
- Wet Bench for Lithography Processes
- Wet Bench for Standard Cleaning (RCA)
- Dry Oxidation Furnace
- Wet Oxidation Furnace
- Low Pressure Chemical Vapour Deposition Furnace for Polycrystalline Silicon
- Low Pressure Chemical Vapour Deposition Furnace for Low Temperature Silicon Dioxide
- Rapid Thermal Processing Furnace
- Electron-Beam and Thermal Evaporation System
- Atomic Layer Deposition Tool
- Inductively-Coupled Plasma Reactive Ion Etching System
- Clean-Room Extension
- Reactive-Ion Etching System
- Reactive-Ion Etching System
- Stylus Profiler
- Sputtering System
- Sputtering System
- Electron-Beam Evaporation System
- Wet Bench for Resist Coating
- Wet Bench for Resist Coating and Development
- Photolithography System (Mask Aligner)
- Atomic-Layer Etching System for Si-based Materials
Archives
- October 2024 (1)
- December 2016 (10)
- November 2016 (18)
- June 2016 (14)
- May 2016 (6)
- April 2016 (19)
- March 2016 (5)
Sitemap created with WP Realtime Sitemap.