- Continue reading →
Electron-Beam Lithography System
Vistec, EBPG 5200
Usage
- Modus Operandi:
Service-Mode - Contamination category:
B and C (dedicated holder) - Sample-size:
from samples of 10×10 mm² up to 8" wafers
FOM-Name and Location
- FOM-Name:
- AMO - E-Beam Litho (Vistec EBPG 5200) - Location:
AMO
Resources
- Tool manager:
AMO - Instruction video:
Not available - Tool description:
E-Beam lithography tool; 50/100 kV; sub 10 nm resolution
- Modus Operandi:
- Continue reading →
Electron-Beam Lithography System
RAITH, eLINE
Usage
- Modus Operandi:
User-mode - Contamination category: B, C
- Sample-size:
Pieces ... 4″
FOM-Name and Location
- FOM-Name:
- Physik - E-Beam Litho (Raith eLINE) - Location:
Physikzentrum, Room 28A315
Resources
- Tool manager:
Lars Schreiber - Instruction video:
Open video - Tool description:
Raith, eLINE
- Modus Operandi:
- Continue reading →
Wet Benches for Solvents, Resists and Developers
Usage
- Modus Operandi:
User-mode - Contamination category: C
- Sample-size:
Pieces ... 4″
FOM-Name and Location
- FOM-Name:
- Physik - Wet Benches - Location:
Physikzentrum, Room 28A313
Resources
- Tool manager:
Natalie Bruger - Instruction video:
Open video - Tool description:
Three wet benches for solvents (isopropanol, acetone), resists (incl. spinner and hotplates) and developers.
- Modus Operandi:
- Continue reading →
Electron Beam Lithography System
Raith, RAITH150 Two
Usage
- Modus Operandi:
User-mode - Contamination category: A,B,C if appropriate chucks are used
- Sample-size:
Pieces ... 6″ wafers
FOM-Name and Location
- FOM-Name:
– IHT – E-Beam Litho (RAITH150 Two) - Location:
WSH, Room 24B102
Resources
- Tool manager:
Birger Berghoff - Instruction video:
- Tool description:
- Modus Operandi:
Back to overview of tools.